1 中国科学院光电技术研究所, 成都 610209
2 中国科学院大学 光电工程学院, 北京 100049
设计了193nm窄角度和宽角度入射增透膜以及正入射高反膜, 其中增透膜s和p偏振光透射率的最大偏差分别为0.17%和0.44%。结合标量散射理论和等效吸收层近似理论, 多层膜间的粗糙界面等效为薄的吸收层, 基于薄膜本征传输矩阵计算分析了不同界面粗糙度下的光谱性能。研究发现, 薄膜光谱性能随着界面均方根粗糙度的增加而急剧退化, 高反膜反射带宽也随之降低, 达到4nm时, 宽角度入射增透膜和高反膜光谱性能在193nm处分别退化2.04%和2.09%。界面粗糙度是影响高光谱性能真空紫外光学薄膜制备的重要因素。
真空紫外光学薄膜 界面粗糙度 等效吸收层 增透膜 高反膜 vacuum ultraviolet optical thin film interface roughness effective absorption layer antireflection coatings high reflection coatings
1 中国科学院光电技术研究所，四川 成都 610209
2 中国科学院光束控制重点实验室，四川 成都 610209
3 中国科学院大学，北京 100049
因为发散角和线宽效应的存在，非平行光束入射窄带滤光片时，滤光片的透射特性会发生变化。特别是在斜入射时，窄带滤光膜透射通带波形更易从矩形向三角形退化，并且伴随峰值透过率降低等负面现象。虽然已知的卷积模型可以对非平行光束入射窄带滤光片的情况进行数值模拟，但是由于制备和测量误差的阻碍，其正确性和数值模拟的准确性没有严格的实验进行验证。通过膜系优化和测量误差修正降低相应误差及其影响，并通过等离子体辅助反应磁控溅射 (PARMS) 的方法制备了工作角度为17°的1 064 nm高性能窄带滤光片。滤光片的透射光谱分别由两款分光光度计Cary 7000和Lambda 1050测量得到。在不同条件下测得的光谱与数值模拟结果吻合得很好，充分验证了卷积模型的有效性和数值模拟的准确性。
窄带滤光片 数值模拟 发散角效应 线宽效应 narrow-band filter numerical simulation divergence-angle effect linewidth effect 红外与激光工程
2022, 51(8): 20210757
1 中国科学院大学光电学院，北京 100049
2 中国科学院光电技术研究所薄膜光学技术研究室，四川 成都 610209
光学薄膜在制备和使用过程中会因缺陷和污染等产生吸收中心，当薄膜受激光辐照后，吸收中心吸收光能会产生热信号，根据热信号可以测量光学薄膜的光学吸收损耗。本文提出基于红外热像仪测量薄膜光学吸收损耗的方法，在测试中加入参考样品可以减少环境温度变化和热像仪噪声对于温度测试结果的影响，对测量过程温度场取一定面积进行平均减少了激光指向波动和光斑分布不理想导致的有限元仿真计算误差。使用本方法测试了小尺寸45°的高反膜吸收损耗，测试得到吸收损耗为7.60 ppm，且测试了同批次大尺寸光学薄膜样品吸收损耗的空间分布情况。使用本方法测量的光学薄膜吸收率和激光量热测试结果一致，不需要长时间的恒温和严格环境温度控制，且测试样品尺寸不受限制。
薄膜光学 吸收损耗 红外热像仪 有限元 吸收测量 optical thin film absorption loss infrared thermography finite element absorption measurement
1 中国科学院光电技术研究所, 四川成都 610209
2 中国科学院大学, 北京 100049
3 电子科技大学光电科学与工程学院, 四川成都 610054
二氧化硅(SiO2)是光学系统中最常用光学薄膜材料之一, 其微观结构、缺陷等信息对于研究和提高薄膜的性能具有重要作用。本文通过电子束蒸发、离子辅助、磁控溅射方法制备 SiO2薄膜并进行测试, 计算出其吸收边光谱, 对吸收边光谱的强吸收区、e指数区、弱吸收区进行分段分析得到 SiO2薄膜的带隙宽度、带尾能量和氧空位缺陷含量数据。进一步分析三种薄膜和其在常规退火温度下的带隙宽度、带尾能量和氧空位缺陷含量的数据, 获得 SiO2薄膜的微观原子排列结构、微观缺陷信息, 并对不同镀膜技术和不同退火温度下 SiO2薄膜的原子排列结构、微观缺陷的差异和变化进行了分析和讨论。
SiO2薄膜 带隙宽度 带尾能量 氧空位缺陷 SiO2 film bandgap Urbach tail energy oxygen deficiency centers 光电工程
2019, 46(4): 18022010
Author Affiliations
Abstract
1 Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2 University of Chinese Academy of Sciences, Beijing 100039, China
3 School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 610054, China
To simultaneously obtain high-resolution multi-wavelength (from visible to near infrared) tomographic images of the solar atmosphere, a high-performance multi-wavelength optical filter has to be used in solar imaging telescopes. In this Letter, the fabrication of the multi-wavelength filter for solar tomographic imaging is described in detail. For this filter, Ta2O5 and SiO2 are used as high- and low-index materials, respectively, and the multilayer structure is optimized by commercial Optilayer software at a 7.5° angle of incidence. Experimentally, this multi-wavelength optical filter is prepared by a plasma ion-assisted deposition technique with optimized deposition parameters. High transmittance at 393.3, 396.8, 430.5, 525, 532.4, 656.8, 705.8, 854.2, 1083, and 1565.3 nm, as well as high reflectance at 500 and 589 nm are achieved. Excellent environmental durability, demonstrated via temperature and humidity tests, is also established.
310.0310 Thin films 310.1860 Deposition and fabrication Chinese Optics Letters
2017, 15(12): 123101
Author Affiliations
Abstract
1 Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2 University of Chinese Academy of Sciences, Beijing 100039, China
To improve the optical performance of an antireflection (AR) coating on a micro-spherical substrate, the ray angle of the incidence distribution and the thickness profile are taken into consideration during the optical coating design. For a convex spherical substrate with a radius of curvature of 10 mm and a clear aperture of 10 mm, three strategies are used for the optimization of the spectral performance of a broadband AR coating in the spectral region from 480 to 720 nm. By comparing the calculated residual reflectance and spectral uniformity, the developed method demonstrates its superiority in spectral performance optimization of an AR coating on a micro-spherical substrate.
310.0310 Thin films 310.1860 Deposition and fabrication 310.6805 Theory and design Chinese Optics Letters
2016, 14(9): 093101
Author Affiliations
Abstract
An approach for determining the optical constants of the weakly absorbing substrate is developed and applied to obtain the parameters of CaF2 and fused silica substrates in deep ultraviolet (DUV) and vacuum ultraviolet (VUV) range. A method for extracting the optical constants of thin films deposited on strongly absorbing substrate, which is based on the reflectance spectra measured at different angles of incidence, is also presented. The optical constants are determined by fitting the measured spectra to the theoretical models. The proposed method is applied to determine the refractive index and extinction coefficient (n, k) of MgF2 film deposited on silicon substrate by electron beam evaporation with substrate temperature 300 oC and deposition rate 0.2 nm/s. The determined n, k values at 193 nm are 1.433 and 9.1 \times 10-4, respectively.
310.0310 Thin films 310.1860 Deposition and fabrication Chinese Optics Letters
2013, 11(s1): S10607
Author Affiliations
Abstract
We report the simulation results on the thickness uniformity of optical coatings deposited on spherical substrates by optimizing the geometric configuration parameters, such as tilting angle of the substrate holder and position of the evaporation source in a 1 000-mm-diameter planetary rotation stage (PRS). We reveal that good film uniformity on convex spherical surfaces or flat substrates, as well as concave surfaces with weak to moderate curvatures can be obtained through appropriate tilting of the substrate holder. For 300-mm-diameter substrates with clear aperture to radius of curvature (CA/RoC) between -0.3 and 0.7, the achievable film uniformity is above 99%. The source position is optimized to achieve good film uniformity.
310.0310 Thin films 310.1860 Deposition and fabrication Chinese Optics Letters
2013, 11(s1): S10213
1 中国科学院光电技术研究所, 四川 成都 610209
2 中国科学院大学, 北京 100049
分别建立了真空镀膜机行星系统中平面光学元件薄膜厚度模型和修正挡板校正薄膜厚度非均匀性模型，并运用数值计算方法完成修正挡板优化设计；研究了使用修正挡板校正薄膜厚度分布时平面行星夹具上热蒸发薄膜材料的沉积效率。实验结果表明：依据修正挡板校正薄膜厚度非均匀性模型优化设计的修正挡板能使口径为310 mm、无倾斜放置的平面行星夹具上，由电子束热蒸发工艺制备的MgF2薄膜厚度均匀性优于99.6%，并且热蒸发MgF2薄膜材料的沉积效率高于87.4%。
薄膜 光学镀膜 厚度均匀性 修正挡板 行星系统
中国科学院光电技术研究所, 四川 成都 610209
根据光腔衰荡光谱技术(CRDS)原理,使用中红外光参变振荡器(OPO)为光源建立了直腔与折叠腔相结合的中红外波段3.6 μm 反射率测量实验装置,用于研究中红外波段的高反射膜反射率,测试精度为10-4。使用直型衰荡光腔测试了三对不同薄膜材料设计镀制的高反射腔镜的反射率,并选择了一对腔镜用于实验装置中。采用该装置精确测试了不同薄膜材料镀制的高反射膜的反射率,包括YbF3/ZnS,YbF3 /ZnSe多层膜,以及由银加保护膜镀制的反射镜。研究表明,中红外波段介质膜的反射率可达到R>0.9990,其中由YbF3/ZnSe镀制在硅基底上的多层介质膜3.6 μm反射率可达到99.96％。
薄膜 反射率 光腔衰荡光谱技术(CRDS) 检测
